Hafnium tetrachloride | HfCl4 hmoov | CAS Nr .: 13499-05-3 Hoobkas nqi

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Hafnium tetrachloride muaj cov ntawv thov tseem ceeb ua tus thawj coj ntawm hafnium oxide, catalyst rau cov organic synthesis, kev siv nuclear, thiab nyias zaj duab xis tso tawm, qhia txog nws txoj kev ua tau zoo thiab qhov tseem ceeb hauv ntau yam kev siv thev naus laus zis.

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Product Detail

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Product Description

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Khoom npe: Hafnium tetrachloride
CAS Nr .: 13499-05-3
Cov roj formula: HfCl4
Molecular Luj: 320.3
Qhov tsos: Dawb hmoov

Specification

Yam khoom	Specification
Qhov tshwm sim	Dawb hmoov
HfCl4+ ZrCl4	≥99.9%
Zr	≤200ppm
Fe	≤40ppm
Ti	≤20ppm
Si	≤40ppm
Mg	≤20ppm
Cr	≤20ppm
Ni	≤25ppm
U	≤ 5ppm
Al	≤60ppm

Daim ntawv thov

Hafnium Dioxide Precursor: Hafnium tetrachloride feem ntau yog siv los ua cov khoom ua ntej los tsim hafnium dioxide (HfO2), cov khoom siv zoo heev dielectric zog. HfO2 yog dav siv nyob rau hauv high-k dielectric daim ntaub ntawv rau transistors thiab capacitors nyob rau hauv semiconductor kev lag luam. HfCl4 yog qhov tseem ceeb hauv kev tsim cov khoom siv hluav taws xob siab heev vim nws muaj peev xwm tsim cov yeeb yaj kiab nyias ntawm hafnium dioxide.
Organic synthesis catalyst: Hafnium tetrachloride tuaj yeem siv los ua ib qho catalyst rau ntau yam organic synthesis tshua, tshwj xeeb tshaj yog olefin polymerization. Nws cov khoom Lewis acid pab tsim cov tshuaj nruab nrab, yog li txhim kho kev ua haujlwm ntawm cov tshuaj tiv thaiv. Daim ntawv thov no muaj txiaj ntsig zoo hauv kev tsim cov polymers thiab lwm cov organic tebchaw hauv kev lag luam tshuaj.
Nuclear Application: Vim nws txoj kev nqus nruab nrab nruab nrab siab hla ntu, hafnium tetrachloride tau siv dav hauv cov ntawv siv hluav taws xob, tshwj xeeb tshaj yog nyob rau hauv kev tswj rods ntawm nuclear reactors. Hafnium tuaj yeem nqus tau cov neutrons zoo, yog li nws yog cov khoom tsim nyog rau kev tswj cov txheej txheem fission, uas pab txhim kho kev nyab xeeb thiab ua haujlwm ntawm lub zog hluav taws xob nuclear.
Nyias zaj duab xis Deposition: Hafnium tetrachloride yog siv rau hauv cov txheej txheem tshuaj vapor deposition (CVD) los tsim cov yeeb yaj kiab nyias ntawm cov khoom siv hafnium. Cov yeeb yaj kiab no yog qhov tseem ceeb hauv ntau yam kev siv, suav nrog microelectronics, optics, thiab txheej tiv thaiv. Lub peev xwm tso nyiaj tsis zoo, cov yeeb yaj kiab zoo ua rau HfCl4 muaj txiaj ntsig hauv cov txheej txheem tsim khoom siab heev.