Lub luag haujlwm tseem ceeb ntawm zirconium tetrachloride nyob rau hauv kev lag luam semiconductor: txhawb kev txhim kho ntawm lwm tiam chip technology

Nrog rau kev loj hlob sai ntawm 5G, kev txawj ntse txawj ntse (AI) thiab Is Taws Nem ntawm Yam (IoT), qhov kev thov rau cov ntaub ntawv ua tau zoo hauv kev lag luam semiconductor tau nce ntau.Zirconium tetrachloride (ZrCl₄)Raws li ib qho tseem ceeb ntawm cov khoom siv semiconductor, tau dhau los ua cov khoom siv tsis tseem ceeb rau cov txheej txheem siab heev (xws li 3nm / 2nm) vim nws lub luag haujlwm tseem ceeb hauv kev npaj cov yeeb yaj kiab high-k.

Zirconium tetrachloride thiab high-k films

Hauv kev tsim khoom semiconductor, high-k films yog ib qho ntawm cov ntaub ntawv tseem ceeb rau kev txhim kho nti. Raws li cov txheej txheem txuas ntxiv ntawm cov tsoos silicon-raws li lub rooj vag dielectric cov ntaub ntawv (xws li SiO₂), lawv cov tuab nce mus txog qhov txwv lub cev, ua rau muaj kev xau ntau ntxiv thiab kev siv hluav taws xob ntau ntxiv. Cov khoom siv high-k (xws li zirconium oxide, hafnium oxide, thiab lwm yam) tuaj yeem ua kom lub cev tuab ntawm dielectric txheej, txo cov nyhuv tunneling, thiab yog li txhim kho kev ruaj ntseg thiab kev ua haujlwm ntawm cov khoom siv hluav taws xob.

Zirconium tetrachloride yog ib qho tseem ceeb precursor rau kev npaj ntawm high-k films. Zirconium tetrachloride tuaj yeem hloov mus rau hauv high-purity zirconium oxide films los ntawm cov txheej txheem xws li tshuaj vapor deposition (CVD) lossis atomic txheej deposition (ALD). Cov yeeb yaj kiab no muaj cov khoom zoo dielectric thiab tuaj yeem txhim kho kev ua tau zoo thiab lub zog ntawm cov chips. Piv txwv li, TSMC tau qhia ntau yam ntaub ntawv tshiab thiab cov txheej txheem kev txhim kho hauv nws cov txheej txheem 2nm, suav nrog kev siv cov yeeb yaj kiab siab dielectric tas li, uas tau ua tiav qhov nce ntawm transistor ntom thiab txo qis ntawm kev siv hluav taws xob.

ZrCl4- hmoov
Electronics & Precision Manufacturing

Ntiaj teb no Supply Chain Dynamics

Nyob rau hauv lub ntiaj teb no semiconductor mov saw, mov thiab ntau lawm qauv ntawmzirconium tetrachlorideyog qhov tseem ceeb rau kev txhim kho kev lag luam. Tam sim no, lub teb chaws thiab cheeb tsam xws li Tuam Tshoj, Tebchaws Meskas thiab Nyij Pooj tau tuav txoj haujlwm tseem ceeb hauv kev tsim cov zirconium tetrachloride thiab lwm yam khoom siv siab dielectric tas li.

Technological breakthroughs thiab yav tom ntej prospects

Kev ua haujlwm thev naus laus zis yog qhov tseem ceeb hauv kev txhawb nqa kev siv zirconium tetrachloride hauv kev lag luam semiconductor. Nyob rau hauv xyoo tas los no, kev ua kom zoo ntawm atomic txheej deposition (ALD) txheej txheem tau dhau los ua qhov kev tshawb fawb hotspot. Cov txheej txheem ALD tuaj yeem tswj xyuas qhov tuab thiab sib xws ntawm zaj duab xis ntawm nanoscale, yog li txhim kho qhov zoo ntawm cov yeeb yaj kiab siab dielectric tas li. Piv txwv li, pab pawg tshawb fawb ntawm Liu Lei ntawm Peking University tau npaj lub siab dielectric tas li amorphous zaj duab xis los ntawm cov txheej txheem dej ntub dej thiab ua tiav nws mus rau ob-dimensional semiconductor electronic devices.

Tsis tas li ntawd, raws li cov txheej txheem semiconductor txuas ntxiv mus rau qhov me me, daim ntawv thov ntawm zirconium tetrachloride kuj nthuav dav. Piv txwv li, TSMC npaj kom ua tiav kev tsim khoom loj ntawm 2nm thev naus laus zis hauv ib nrab xyoo 2025, thiab Samsung tseem nquag txhawb kev tshawb fawb thiab kev tsim kho ntawm nws cov txheej txheem 2nm. Lub realization ntawm cov txheej txheem siab heev yog inseparable los ntawm kev txhawb nqa ntawm high-dielectric tas li films, thiab zirconium tetrachloride, raws li ib tug tseem ceeb raw cov ntaub ntawv, yog qhov tseem ceeb ntawm nws tus kheej.

Hauv cov ntsiab lus, lub luag haujlwm tseem ceeb ntawm zirconium tetrachloride hauv kev lag luam semiconductor tau dhau los ua qhov tseem ceeb. Nrog rau qhov nrov ntawm 5G, AI thiab Is Taws Nem ntawm Yam, qhov kev thov rau cov chips ua tau zoo tseem nce ntxiv. Zirconium tetrachloride, uas yog ib qho tseem ceeb precursor ntawm high-dielectric tas li films, yuav ua lub luag hauj lwm irreplaceable nyob rau hauv txhawb kev loj hlob ntawm lwm tiam chip technology. Nyob rau hauv lub neej yav tom ntej, nrog kev nce qib ntawm thev naus laus zis thiab kev ua kom zoo ntawm cov saw hlau thoob ntiaj teb, daim ntawv thov kev cia siab ntawm zirconium tetrachloride yuav dav dua.


Post lub sij hawm: Apr-14-2025